Sputtering Targets and Evaporation Materials
Sputtering Targets
- Metal sputtering targets
- Alloy sputtering targets
- Ceramic sputtering targets
Evaporation materials on raw materials
Metal evaporation material- Oxide evaporation materials
- Fluorid evaporation materials
- Others
Nanometer Materials
- Aluminum Nitride (AlN), Cerium Oxide (CeO2), Europium Oxide (Eu2O3), Erbium Oxide ( Er2O3), Gadolinium Oxide ( Gd2O3), Lanthanum (LawO3), Neodymium Oxide (Nd2O3), Praseodymium Oxide (Pr6O11), Samarium Oxide (Sm2O3), Silicon Carbide (|?-Sic), Silicon Nitride whisker (Si3N4), Amorphous Silicon Nitride (|á-Si3N4), Titanium Carbide (TiC), Titanium Nitride (TiN), Ytterbium Oxide (Yb2O3), Yttrium Oxide (Y2O3)
MATERIALS
- Semiconductor Si wafers and Solar wafers
- Silicon on insulator (SOI) wafers
- Mask blanks (soda lime and quartz)
- Glass wafers (Pyrex 7740, quartz, soda lime, etc)
- AIIIBV compounds (GaAs, GaP, InP, InAs, etc)
- Sapphire wafers
- Sputtering targets
- Thin films-Oxide, nitride
- Packing boxes for crystal, wafers, filter, chip, etc
- Optical component
SERVICES
- Fabrication of soda lime/quartz photolithographic masks
- Silicon microfabrication (wet etching, dry etching and wafer bonding)
- Consultancy of fabrication process
- Characterization of microdevices/microsystems
- Consultancy of microfluidics and biological microdevices
Service Hotline:
Tel.: +65-6515 8750
Fax : +65-6515 8795
Email: sales@bondatek.com