• Bonda Technology
  • Bonda Technology
  • Bonda Technology
  • Bonda Technology
  • Bonda Technology
  • Bonda Technology
  • Bonda Technology

Mask Fabrication

Lithographic photomasks are typically transparent glass templates covered with chrome patterns. They are designed to optically transfer patterns to wafers or other substrates in microfabrication.

Depending on the difference of the substrates, Bonda Tech fabricates three types of photomasks: quartz masks, soda lime masks and mylar masks. The attainable critical dimensions (CD, i.e. minimum feature sizes) for these three types of masks are 0.75, 1.5, and 25 micrometers, respectively. Typical mask dimensions are 3"x3", 4"x4", 5"x5", 6"x6" and 7"x7". These photomasks are either direct-written by e-beam or laser systems or are manufactured from reticles using photo repeater system.

Tighter specifications, larger mask sizes and other types of masks are also available upon request. Contact us for more information about our capabilities.


  • Semiconductor Si wafers and Solar wafers
  • Silicon on insulator (SOI) wafers
  • Mask blanks (soda lime and quartz)
  • Glass wafers (Pyrex 7740, quartz, soda lime, etc)
  • AIIIBV compounds (GaAs, GaP, InP, InAs, etc)
  • Sapphire wafers
  • Sputtering targets
  • Thin films-Oxide, nitride
  • Packing boxes for crystal, wafers, filter, chip, etc
  • Optical component


  • Fabrication of soda lime/quartz photolithographic masks
  • Silicon microfabrication (wet etching, dry etching and wafer bonding)
  • Consultancy of fabrication process
  • Characterization of microdevices/microsystems
  • Consultancy of microfluidics and biological microdevices

    Service Hotline:
    Tel.: +65-6515 8750
    Fax : +65-6515 8795
    Email: sales@bondatek.com